Solution-processed thin film transistors incorporating YSZ gate dielectrics processed at 400 °C
نویسندگان
چکیده
This work investigates a solution process for yttria-stabilized zirconia (YSZ) thin film deposition involving the addition of yttria nanoparticles, at 400 °C, in air. Different yttrium doping levels YSZ were studied and wide range optical, structural, surface, dielectric, electronic transport properties also investigated. An optimum level 5% mol. resulted smoothest films (R RMS ∼ 0.5 nm), bandgap (∼5.96 eV), dielectric constant excess 26, leakage current ∼0.3 nA cm −2 2 MV/cm. The solution-processed incorporated as gate dielectrics transistors with In O 3 semiconducting channels. Excellent operational characteristics, such negligible hysteresis, low voltages (5 V), electron mobility 36 V −1 s , high on/off modulation ratio on order 10 7 interfacial trap density states (<10 12 ), demonstrated. addition, excellent homogeneity was achieved over large area (16 × 16 both thickness capacitance deviation <1.2%.
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ژورنال
عنوان ژورنال: APL Materials
سال: 2022
ISSN: ['2166-532X']
DOI: https://doi.org/10.1063/5.0079195